Clough, FJ and Brown, AO and Ekkanath Madathil, SN and Milne, WI (1995) Low-temperature (≤600 °C) semi-insulating oxygen-doped silicon films by the PECVD technique for large-area power applications. Thin Solid Films, 270. pp. 517-521. ISSN 0040-6090
Full text not available from this repository.
| Item Type: | Article |
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| Subjects: | UNSPECIFIED |
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| Divisions: | UNSPECIFIED |
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| Depositing User: | Cron Job |
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| Date Deposited: | 28 Oct 2011 16:42 |
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| Last Modified: | 15 Nov 2011 10:17 |
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| DOI: | 10.1016/0040-6090(95)06834-1 |
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