Clough, FJ and Brown, AO and Ekkanath Madathil, SN and Milne, WI (1995) Low temperature (≤ 600°C) semi-insulating oxygen-doped silicon films by the PECVD technique for large area power applications. Microelectronic Engineering, 28. pp. 451-454. ISSN 0167-9317
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|Item Type: ||Article|
|Depositing User: ||Cron Job|
|Date Deposited: ||28 Oct 2011 16:42|
|Last Modified: ||27 May 2013 01:20|
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