Clough, FJ and Brown, AO and Ekkanath Madathil, SN and Milne, WI (1995) Low temperature (≤ 600°C) semi-insulating oxygen-doped silicon films by the PECVD technique for large area power applications. Microelectronic Engineering, 28. pp. 451-454. ISSN 0167-9317Full text not available from this repository.
|Divisions:||Div B > Solid State Electronics and Nanoscale Science|
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|Date Deposited:||09 Dec 2016 18:51|
|Last Modified:||25 Mar 2017 22:48|