Gimzewski, JK and Berndt, R and Schittler, R and McKinnon, AW and Welland, ME and Wong, TMH and Dumas, P and Gu, R and Syarkh, S and Salvan, F and Hallimaoui, A (1993) Spatially resolved electrical measurements of SiO2 gate oxides using atomic force microscopy. Applied Physics Letters, 62. pp. 786-788. ISSN 0003-6951Full text not available from this repository.
|Depositing User:||Cron job|
|Date Deposited:||16 Jul 2015 13:45|
|Last Modified:||26 Jul 2015 03:01|