Uchida, Y and Milne, WI and Deane, SC (1992) Posthydrogenation of low-pressure chemical-vapor-deposited amorphous silicon using a novel internal lamp system and its application to thin-film transistor fabrication. Journal of Applied Physics, 72. pp. 3150-3154. ISSN 0021-8979Full text not available from this repository.
|Depositing User:||Cron job|
|Date Deposited:||04 Feb 2015 22:19|
|Last Modified:||01 May 2015 18:53|