CUED Publications database

Posthydrogenation of low-pressure chemical-vapor-deposited amorphous silicon using a novel internal lamp system and its application to thin-film transistor fabrication

Uchida, Y and Milne, WI and Deane, SC (1992) Posthydrogenation of low-pressure chemical-vapor-deposited amorphous silicon using a novel internal lamp system and its application to thin-film transistor fabrication. Journal of Applied Physics, 72. pp. 3150-3154. ISSN 0021-8979

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:34
Last Modified: 06 Oct 2014 01:24
DOI: 10.1063/1.352327

Actions (login required)

View Item