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Posthydrogenation of low-pressure chemical-vapor-deposited amorphous silicon using a novel internal lamp system and its application to thin-film transistor fabrication

Uchida, Y and Milne, WI and Deane, SC (1992) Posthydrogenation of low-pressure chemical-vapor-deposited amorphous silicon using a novel internal lamp system and its application to thin-film transistor fabrication. Journal of Applied Physics, 72. pp. 3150-3154. ISSN 0021-8979

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Unnamed user with email sms67@cam.ac.uk
Date Deposited: 16 Jul 2015 13:14
Last Modified: 03 Sep 2015 22:36
DOI: 10.1063/1.352327