Uchida, Y and Milne, WI and Deane, SC (1992) Posthydrogenation of low-pressure chemical-vapor-deposited amorphous silicon using a novel internal lamp system and its application to thin-film transistor fabrication. Journal of Applied Physics, 72. pp. 3150-3154. ISSN 0021-8979
Full text not available from this repository.
| Item Type: | Article |
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| Subjects: | UNSPECIFIED |
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| Divisions: | UNSPECIFIED |
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| Depositing User: | Cron Job |
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| Date Deposited: | 28 Oct 2011 16:41 |
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| Last Modified: | 11 Mar 2013 01:58 |
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| DOI: | 10.1063/1.352327 |
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