Amaratunga, GAJ and Milne, WI and Clay, KJ and Putnis, A (1989) The effect of annealing on PECVD SiOx thin films made from N20:SiH4:He gas mixtures. Singapore Journal of Physics, 6. pp. 29-38. ISSN 0217-4251
Full text not available from this repository.Item Type: | Article |
---|---|
Subjects: | UNSPECIFIED |
Divisions: | Div B > Electronics, Power & Energy Conversion Div B > Solid State Electronics and Nanoscale Science |
Depositing User: | Cron Job |
Date Deposited: | 17 Jul 2017 20:04 |
Last Modified: | 18 Feb 2021 15:17 |
DOI: |