Amaratunga, GAJ and Milne, WI and Clay, KJ and Putnis, A (1989) The effect of annealing on PECVD SiOx thin films made from N20:SiH4:He gas mixtures. Singapore Journal of Physics, 6. pp. 29-38. ISSN 0217-4251
Full text not available from this repository.| Item Type: | Article |
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| Subjects: | UNSPECIFIED |
| Divisions: | UNSPECIFIED |
| Depositing User: | Cron job |
| Date Deposited: | 04 Feb 2015 23:15 |
| Last Modified: | 05 Feb 2015 01:34 |
| DOI: |
