Weatherup, RS and Bayer, BC and Blume, R and Ducati, C and Baehtz, C and Schlögl, R and Hofmann, S (2011) In situ characterization of alloy catalysts for low-temperature graphene growth. Nano Lett, 11. pp. 4154-4160.Full text not available from this repository.
Low-temperature (∼450 °C), scalable chemical vapor deposition of predominantly monolayer (74%) graphene films with an average D/G peak ratio of 0.24 and domain sizes in excess of 220 μm(2) is demonstrated via the design of alloy catalysts. The admixture of Au to polycrystalline Ni allows a controlled decrease in graphene nucleation density, highlighting the role of step edges. In situ, time-, and depth-resolved X-ray photoelectron spectroscopy and X-ray diffraction reveal the role of subsurface C species and allow a coherent model for graphene formation to be devised.
|Divisions:||Div B > Solid State Electronics and Nanoscale Science|
|Depositing User:||Cron Job|
|Date Deposited:||15 Dec 2015 12:55|
|Last Modified:||14 Feb 2016 03:09|