Weatherup, RS and Bayer, BC and Blume, R and Ducati, C and Baehtz, C and Schlögl, R and Hofmann, S (2011) In situ characterization of alloy catalysts for low-temperature graphene growth. Nano Lett, 11. pp. 4154-4160.
Full text not available from this repository.Abstract
Low-temperature (∼450 °C), scalable chemical vapor deposition of predominantly monolayer (74%) graphene films with an average D/G peak ratio of 0.24 and domain sizes in excess of 220 μm(2) is demonstrated via the design of alloy catalysts. The admixture of Au to polycrystalline Ni allows a controlled decrease in graphene nucleation density, highlighting the role of step edges. In situ, time-, and depth-resolved X-ray photoelectron spectroscopy and X-ray diffraction reveal the role of subsurface C species and allow a coherent model for graphene formation to be devised.
| Item Type: | Article |
|---|---|
| Subjects: | UNSPECIFIED |
| Divisions: | UNSPECIFIED |
| Depositing User: | Cron Job |
| Date Deposited: | 04 Nov 2011 15:46 |
| Last Modified: | 20 May 2013 01:31 |
| DOI: | 10.1021/nl202036y |
Actions (login required)
| View Item |
