CUED Publications database

Characterization of C:H:N deposition from CH4/N-2 rf plasmas using optical emission spectroscopy

Clay, KJ and Speakman, SP and Amaratunga, GAJ and Silva, SRP (1996) Characterization of C:H:N deposition from CH4/N-2 rf plasmas using optical emission spectroscopy. J APPL PHYS, 79. pp. 7227-7233. ISSN 0021-8979

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Item Type: Article
Uncontrolled Keywords: AMORPHOUS-CARBON FILMS LASER-INDUCED PLASMA DIAMOND NITRIDE DISCHARGE DILUTION GAS CH4
Subjects: UNSPECIFIED
Divisions: Div B > Electronics, Power & Energy Conversion
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:21
Last Modified: 13 Oct 2014 01:18
DOI: