Milne, WI and Teo, KBK and Chhowalla, M and Amaratunga, GAJ and Yuan, J and Robertson, J and Legagneux, P and Pirio, G and Bouzehouane, K and Pribat, D and Bruenger, W and Trautmann, C (2001) Investigating carbon materials for use as the electron emission source in a parallel electron-beam lithography system. Current Applied Physics, 1. pp. 317-320. ISSN 1567-1739Full text not available from this repository.
|Divisions:||Div B > Electronics, Power & Energy Conversion|
|Depositing User:||Cron Job|
|Date Deposited:||20 Dec 2011 12:10|
|Last Modified:||14 Oct 2013 01:16|
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