CUED Publications database

Investigating carbon materials for use as the electron emission source in a parallel electron-beam lithography system

Milne, WI and Teo, KBK and Chhowalla, M and Amaratunga, GAJ and Yuan, J and Robertson, J and Legagneux, P and Pirio, G and Bouzehouane, K and Pribat, D and Bruenger, W and Trautmann, C (2001) Investigating carbon materials for use as the electron emission source in a parallel electron-beam lithography system. Current Applied Physics, 1. pp. 317-320. ISSN 1567-1739

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Electronics, Power & Energy Conversion
Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 12:09
Last Modified: 17 Mar 2014 14:31
DOI:

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