Milne, WI and Teo, KBK and Chhowalla, M and Amaratunga, GAJ and Yuan, J and Robertson, J and Legagneux, P and Pirio, G and Bouzehouane, K and Pribat, D and Bruenger, W and Trautmann, C (2001) Investigating carbon materials for use as the electron emission source in a parallel electron-beam lithography system. Current Applied Physics, 1. pp. 317-320. ISSN 1567-1739Full text not available from this repository.
|Divisions:||Div B > Electronics, Power & Energy Conversion|
Div B > Solid State Electronics and Nanoscale Science
|Depositing User:||Cron Job|
|Date Deposited:||07 Mar 2014 12:09|
|Last Modified:||06 Oct 2014 01:24|