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Defined etching of carbon-diamond films on silicon using an oxygen plasma with titanium masking

Chan, KK and Amaratunga, GAJ and Wong, TKS (1992) Defined etching of carbon-diamond films on silicon using an oxygen plasma with titanium masking. Diamond and Related Materials, 1. pp. 281-284. ISSN 0925-9635

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Electronics, Power & Energy Conversion
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:33
Last Modified: 10 Mar 2014 16:11
DOI:

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