CUED Publications database

Defined etching of carbon-diamond films on silicon using an oxygen plasma with titanium masking

Chan, KK and Amaratunga, GAJ and Wong, TKS (1992) Defined etching of carbon-diamond films on silicon using an oxygen plasma with titanium masking. Diamond and Related Materials, 1. pp. 281-284. ISSN 0925-9635

Full text not available from this repository.

Abstract

A technique for pattern transfer onto carbon-diamond films deposited by radio-frequency plasma-enhanced chemical vapour deposition is reported. Such a technique involves standard photolithography processes and reactive ion etching by oxygen and is compatible with present day microelectronic technology. The patterns transferred are well defined with very good resolution. © 1992.

Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Electronics, Power & Energy Conversion
Depositing User: Cron Job
Date Deposited: 02 Sep 2016 16:27
Last Modified: 26 Sep 2016 10:34
DOI: