Chan, KK and Amaratunga, GAJ and Wong, TKS (1992) Defined etching of carbon-diamond films on silicon using an oxygen plasma with titanium masking. Diamond and Related Materials, 1. pp. 281-284. ISSN 0925-9635Full text not available from this repository.
A technique for pattern transfer onto carbon-diamond films deposited by radio-frequency plasma-enhanced chemical vapour deposition is reported. Such a technique involves standard photolithography processes and reactive ion etching by oxygen and is compatible with present day microelectronic technology. The patterns transferred are well defined with very good resolution. © 1992.
|Depositing User:||Cron job|
|Date Deposited:||04 Feb 2015 22:12|
|Last Modified:||05 Feb 2015 00:17|