Chan, KK and Amaratunga, GAJ and Wong, TKS (1992) Defined etching of carbon-diamond films on silicon using an oxygen plasma with titanium masking. Diamond and Related Materials, 1. pp. 281-284. ISSN 0925-9635Full text not available from this repository.
A technique for pattern transfer onto carbon-diamond films deposited by radio-frequency plasma-enhanced chemical vapour deposition is reported. Such a technique involves standard photolithography processes and reactive ion etching by oxygen and is compatible with present day microelectronic technology. The patterns transferred are well defined with very good resolution. © 1992.
|Divisions:||Div B > Electronics, Power & Energy Conversion|
|Depositing User:||Cron Job|
|Date Deposited:||09 Dec 2016 17:45|
|Last Modified:||19 Jan 2017 03:29|