CUED Publications database

Defined etching of carbon-diamond films on silicon using an oxygen plasma with titanium masking

Chan, KK and Amaratunga, GAJ and Wong, TKS (1992) Defined etching of carbon-diamond films on silicon using an oxygen plasma with titanium masking. Diamond and Related Materials, 1. pp. 281-284. ISSN 0925-9635

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Abstract

A technique for pattern transfer onto carbon-diamond films deposited by radio-frequency plasma-enhanced chemical vapour deposition is reported. Such a technique involves standard photolithography processes and reactive ion etching by oxygen and is compatible with present day microelectronic technology. The patterns transferred are well defined with very good resolution. © 1992.

Item Type: Article
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Cron job
Date Deposited: 16 Jul 2015 13:33
Last Modified: 30 Aug 2015 02:58
DOI: 10.1016/0925-9635(92)90040-U