Boies, AM and Roberts, JT and Girshick, SL and Zhang, B and Nakamura, T and Mochizuki, A (2009) SiO2 coating of silver nanoparticles by photoinduced chemical vapor deposition. Nanotechnology, 20. 295604-.
Full text not available from this repository.Abstract
Gas-phase silver nanoparticles were coated with silicon dioxide (SiO2) by photoinduced chemical vapor deposition (photo-CVD). Silver nanoparticles, produced by inert gas condensation, and a SiO2 precursor, tetraethylorthosilicate (TEOS), were exposed to vacuum ultraviolet (VUV) radiation at atmospheric pressure and varying temperatures. The VUV photons dissociate the TEOS precursor, initiating a chemical reaction that forms SiO2 coatings on the particle surfaces. Coating thicknesses were measured for a variety of operation parameters using tandem differential mobility analysis and transmission electron microscopy. The chemical composition of the particle coatings was analyzed using energy dispersive x-ray spectrometry and Fourier transform infrared spectroscopy. The highest purity films were produced at 300-400 degrees C with low flow rates of additional oxygen. The photo-CVD coating technique was shown to effectively coat nanoparticles and limit core particle agglomeration at concentrations up to 10(7) particles cm(-3).
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | Equipment Design Gases Metal Nanoparticles Microscopy, Electron, Transmission Nanotechnology Photochemistry Silanes Silicon Dioxide Silver Spectroscopy, Fourier Transform Infrared Ultraviolet Rays Vacuum Volatilization |
| Subjects: | UNSPECIFIED |
| Divisions: | Div A > Energy |
| Depositing User: | Cron Job |
| Date Deposited: | 07 Nov 2011 16:56 |
| Last Modified: | 20 May 2013 01:41 |
| DOI: | 10.1088/0957-4484/20/29/295604 |
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