Robertson, J and Xiong, K and Tse, KY (2007) Importance of oxygen vacancies in high K gate dielectrics. In: UNSPECIFIED pp. 97-100..
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| Item Type: | Conference or Workshop Item (UNSPECIFIED) |
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| Uncontrolled Keywords: | high K oxide oxygen vacancy metal gate work function BAND ALIGNMENT OXIDES SI INSTABILITY TECHNOLOGY DEVICES |
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| Subjects: | UNSPECIFIED |
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| Divisions: | UNSPECIFIED |
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| Depositing User: | Cron Job |
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| Date Deposited: | 19 Jan 2012 11:12 |
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| Last Modified: | 20 May 2013 01:38 |
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| DOI: | |
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