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Deposition mechanism of hydrogenated amorphous silicon

Robertson, J (2000) Deposition mechanism of hydrogenated amorphous silicon. J APPL PHYS, 87. pp. 2608-2617. ISSN 0021-8979

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Item Type: Article
Uncontrolled Keywords: A-SI-H CHEMICAL VAPOR-DEPOSITION DEFECT-POOL MODEL FILM GROWTH PLASMA DEPOSITION TEMPERATURE-DEPENDENCE CRYSTALLINE SILICON SURFACE-REACTIONS ION-BOMBARDMENT SILANE PLASMA
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:25
Last Modified: 11 Aug 2014 01:10
DOI:

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