CUED Publications database

Deposition mechanism of hydrogenated amorphous silicon

Robertson, J (2000) Deposition mechanism of hydrogenated amorphous silicon. J APPL PHYS, 87. pp. 2608-2617. ISSN 0021-8979

Full text not available from this repository.
Item Type: Article
Uncontrolled Keywords: A-SI-H CHEMICAL VAPOR-DEPOSITION DEFECT-POOL MODEL FILM GROWTH PLASMA DEPOSITION TEMPERATURE-DEPENDENCE CRYSTALLINE SILICON SURFACE-REACTIONS ION-BOMBARDMENT SILANE PLASMA
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Cron job
Date Deposited: 04 Feb 2015 22:18
Last Modified: 05 Feb 2015 00:25
DOI: