Cakmak, B and Yu, SY and Penty, RV and White, IH (2000) Smooth and anisotropic ion beam etching of InP with Ar/H-2 chemistry. In: UNSPECIFIED pp. 139-146..
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| Item Type: | Conference or Workshop Item (UNSPECIFIED) |
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| Uncontrolled Keywords: | ion beam etching chemically assisted ion beam etching InP H2/CH4 chemistry MIXTURES |
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| Subjects: | UNSPECIFIED |
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| Divisions: | Div B > Photonics |
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| Depositing User: | Cron Job |
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| Date Deposited: | 07 Dec 2011 17:10 |
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| Last Modified: | 20 May 2013 01:34 |
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| DOI: | |
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