Cakmak, B and Yu, SY and Penty, RV and White, IH (2000) Smooth and anisotropic ion beam etching of InP with Ar/H-2 chemistry. In: UNSPECIFIED pp. 139-146..
Full text not available from this repository.
|Item Type: ||Conference or Workshop Item (UNSPECIFIED)|
|Uncontrolled Keywords: ||ion beam etching chemically assisted ion beam etching InP H2/CH4 chemistry MIXTURES|
|Divisions: ||Div B > Photonics|
|Depositing User: ||Cron Job|
|Date Deposited: ||07 Dec 2011 17:10|
|Last Modified: ||20 May 2013 01:34|
Actions (login required)