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Nanocrystalline Silicon Thin Films Fabricated at 80 degrees C by Using Electron Cyclotron Resonance Chemical Vapor Deposition

Bu, IYY and Flewitt, AJ and Miline, WI (2010) Nanocrystalline Silicon Thin Films Fabricated at 80 degrees C by Using Electron Cyclotron Resonance Chemical Vapor Deposition. PLASMA SCI TECHNOL, 12. pp. 608-613. ISSN 1009-0630

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Item Type: Article
Uncontrolled Keywords: low temperature nanocrystalline silicon ECR SI-H AMORPHOUS-SILICON PLASMA TRANSISTORS REACTOR GROWTH PERFORMANCE STABILITY PRESSURE DISPLAYS
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:32
Last Modified: 17 Mar 2014 14:45
DOI: 10.1088/1009-0630/12/5/19

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