Bu, IYY and Flewitt, AJ and Miline, WI (2010) Nanocrystalline Silicon Thin Films Fabricated at 80 degrees C by Using Electron Cyclotron Resonance Chemical Vapor Deposition. PLASMA SCI TECHNOL, 12. pp. 608-613. ISSN 1009-0630
Full text not available from this repository.
| Item Type: | Article |
|---|
| Uncontrolled Keywords: | low temperature nanocrystalline silicon ECR SI-H AMORPHOUS-SILICON PLASMA TRANSISTORS REACTOR GROWTH PERFORMANCE STABILITY PRESSURE DISPLAYS |
|---|
| Subjects: | UNSPECIFIED |
|---|
| Divisions: | UNSPECIFIED |
|---|
| Depositing User: | Cron Job |
|---|
| Date Deposited: | 21 Dec 2011 09:10 |
|---|
| Last Modified: | 20 May 2013 01:40 |
|---|
| DOI: | 10.1088/1009-0630/12/5/19 |
|---|
Actions (login required)
