CUED Publications database

Maximizing performance for higher K gate dielectrics

Robertson, J (2008) Maximizing performance for higher K gate dielectrics. J APPL PHYS, 104. -. ISSN 0021-8979

Full text not available from this repository.
Item Type: Article
Uncontrolled Keywords: hafnium compounds high-k dielectric thin films permittivity silicon compounds zirconium compounds EFFECTIVE WORK FUNCTION OXIDE THIN-FILMS ELECTRICAL-PROPERTIES BAND-STRUCTURE STACK TECHNOLOGY METAL-OXIDES V-FB SILICON LANTHANUM ZIRCONIA
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Unnamed user with email sms67@cam.ac.uk
Date Deposited: 16 Jul 2015 13:32
Last Modified: 29 Aug 2015 21:50
DOI: 10.1063/1.3041628