Xiong, K and Robertson, J and Pourtois, G and Petry, J and Muller, M (2008) Impact of incorporated Al on the TiN/HfO2 interface effective work function. J APPL PHYS, 104. -. ISSN 0021-8979
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| Item Type: | Article |
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| Uncontrolled Keywords: | FUNCTION MODULATION ION-IMPLANTATION GATE OXIDES METAL TECHNOLOGY ELECTRODES STABILITY ZIRCONIA DEVICES STACKS |
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| Subjects: | UNSPECIFIED |
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| Divisions: | UNSPECIFIED |
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| Depositing User: | Cron Job |
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| Date Deposited: | 19 Jan 2012 10:12 |
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| Last Modified: | 25 Mar 2013 01:13 |
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| DOI: | 10.1063/1.2986158 |
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