CUED Publications database

Selective epitaxial growth in silicon on insulator: Planarity and mass flow

Williams, DA and McMahon, RA and Ahmed, H and Garry, G and Karapiperis, L and Dieumegard, D (1989) Selective epitaxial growth in silicon on insulator: Planarity and mass flow. Journal of Applied Physics, 65. pp. 3718-3721. ISSN 0021-8979

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Abstract

Seeded zone-melt recrystallization using a dual electron beam system has been performed on silicon-on-insulator material, which was prepared with single-crystal silicon filling of the seed windows by selective epitaxial growth. The crystal quality has been assessed by a variety of microscopic techniques, and it is shown that single-crystal films 0.5-1.0 μm thick over 1.0 μm of isolating oxide may be prepared by this method. These films have considerably less lateral variation in thickness than standard material, in which the windows are not so filled. The filling method is suitable for both single- and multiple-layer silicon-on-insulator, and gives the advantages of excellent layer uniformity after recrystallization and improved planarity of the whole chip structure. Experiments using various amounts of seed window filling have shown that the lateral variations of silicon film thickness seen in unplanarized material are due to stress relief in the cap oxide when the silicon film is molten, rather than the effect previously postulated in which they were assumed to be due to the contraction of silicon on melting.

Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Electronics, Power & Energy Conversion
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:32
Last Modified: 18 Dec 2014 19:02
DOI: 10.1063/1.342602