Li, H and Lin, L and Xiong, K and Robertson, J (2011) Atomic bonding and disorder at Ge:GeO2 interfaces. In: UNSPECIFIED pp. 1564-1568..
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| Item Type: | Conference or Workshop Item (UNSPECIFIED) |
| Uncontrolled Keywords: | Germanium Germanium dioxide High mobility channel Passivation Calculation Electronic structure Defects Band offsets TRANSITION REGIONS SI-SIO2 INTERFACES SILICON DIOXIDE OXYGEN VACANCY DEFECTS SIO2 MOBILITY MOSFETS UNIVERSALITY GERMANIUM |
| Subjects: | UNSPECIFIED |
| Divisions: | UNSPECIFIED |
| Depositing User: | Cron Job |
| Date Deposited: | 19 Jan 2012 10:12 |
| Last Modified: | 20 May 2013 01:31 |
| DOI: | 10.1016/j.mee.2011.03.136 |
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