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High K Dielectrics for Future CMOS Devices

Robertson, J (2009) High K Dielectrics for Future CMOS Devices. In: UNSPECIFIED pp. 579-591..

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Item Type: Conference or Workshop Item (UNSPECIFIED)
Uncontrolled Keywords: OXIDES TECHNOLOGY STABILITY SILICON
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:58
Last Modified: 17 Mar 2014 15:02
DOI:

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