CUED Publications database

High K Dielectrics for Future CMOS Devices

Robertson, J (2009) High K Dielectrics for Future CMOS Devices. In: UNSPECIFIED pp. 579-591..

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Item Type: Conference or Workshop Item (UNSPECIFIED)
Uncontrolled Keywords: OXIDES TECHNOLOGY STABILITY SILICON
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Cron job
Date Deposited: 04 Feb 2015 22:31
Last Modified: 05 Feb 2015 19:02
DOI: