Robertson, J (2009) High K Dielectrics for Future CMOS Devices. In: UNSPECIFIED pp. 579-591..
Full text not available from this repository.| Item Type: | Conference or Workshop Item (UNSPECIFIED) |
|---|---|
| Uncontrolled Keywords: | OXIDES TECHNOLOGY STABILITY SILICON |
| Subjects: | UNSPECIFIED |
| Divisions: | UNSPECIFIED |
| Depositing User: | Cron Job |
| Date Deposited: | 19 Jan 2012 10:12 |
| Last Modified: | 11 Mar 2013 02:06 |
| DOI: |
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