CUED Publications database

Mechanisms for defect creation and removal in hydrogenated and deuterated amorphous silicon studied using thin film transistors

Flewitt, AJ and Lin, S and Milne, WI and Wehrspohn, RB and Powell, MJ (2007) Mechanisms for defect creation and removal in hydrogenated and deuterated amorphous silicon studied using thin film transistors. In: UNSPECIFIED pp. 449-460..

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Item Type: Conference or Workshop Item (UNSPECIFIED)
Uncontrolled Keywords: IMPROVED STABILITY DIFFUSION METASTABILITY ALLOY MODEL SI
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Unnamed user with email sms67@cam.ac.uk
Date Deposited: 15 Dec 2015 12:44
Last Modified: 29 Apr 2016 00:05
DOI: