CUED Publications database

Mechanisms for defect creation and removal in hydrogenated and deuterated amorphous silicon studied using thin film transistors

Flewitt, AJ and Lin, S and Milne, WI and Wehrspohn, RB and Powell, MJ (2007) Mechanisms for defect creation and removal in hydrogenated and deuterated amorphous silicon studied using thin film transistors. In: UNSPECIFIED pp. 449-460..

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Item Type: Conference or Workshop Item (UNSPECIFIED)
Uncontrolled Keywords: IMPROVED STABILITY DIFFUSION METASTABILITY ALLOY MODEL SI
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Cron job
Date Deposited: 04 Feb 2015 22:24
Last Modified: 05 Feb 2015 00:34
DOI: