Flewitt, AJ and Lin, S and Milne, WI and Wehrspohn, RB and Powell, MJ (2006) Mechanisms for defect creation and removal in hydrogenated and deuterated amorphous silicon studied using thin film transistors. In: Symposium A: Amorphous and Nanocrystalline Silicon-Based Films--2006, 17-4-2006 to 21-4-2006, San Francisco, CA, US pp. 449-460..
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|Item Type: ||Conference or Workshop Item (UNSPECIFIED)|
|Additional Information: ||Id number = Paper No: 0910-A19-01 Event type = other|
|Uncontrolled Keywords: ||IMPROVED STABILITY DIFFUSION METASTABILITY ALLOY MODEL SI|
|Depositing User: ||Cron Job|
|Date Deposited: ||20 Dec 2011 12:10|
|Last Modified: ||11 Mar 2013 02:01|
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