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THE ANNEALING BEHAVIOR OF HIGH-DOSE AS+ IMPLANTS

HASKO, DG and MCMAHON, RA and AHMED, H (1983) THE ANNEALING BEHAVIOR OF HIGH-DOSE AS+ IMPLANTS. J PHYS-PARIS, 44. pp. 223-227. ISSN 0302-0738

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Electronics, Power & Energy Conversion
Depositing User: Unnamed user with email sms67@cam.ac.uk
Date Deposited: 18 May 2016 19:06
Last Modified: 24 May 2016 22:00
DOI: