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A STUDY OF PULSED LASER AND MULTIPLE-SCAN ELECTRON-BEAM ANNEALING OF ARSENIC FOR N-CHANNEL MOS-TRANSISTOR SOURCE DRAIN REGIONS

GODFREY, DJ and ADAMS, AE and MCMAHON, RA and AHMED, H (1982) A STUDY OF PULSED LASER AND MULTIPLE-SCAN ELECTRON-BEAM ANNEALING OF ARSENIC FOR N-CHANNEL MOS-TRANSISTOR SOURCE DRAIN REGIONS. J ELECTROCHEM SOC, 129. C325-C325. ISSN 0013-4651

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Item Type: Article
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Depositing User: Cron job
Date Deposited: 04 Feb 2015 22:18
Last Modified: 05 Feb 2015 00:26
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