CUED Publications database

A STUDY OF PULSED LASER AND MULTIPLE-SCAN ELECTRON-BEAM ANNEALING OF ARSENIC FOR N-CHANNEL MOS-TRANSISTOR SOURCE DRAIN REGIONS

GODFREY, DJ and ADAMS, AE and MCMAHON, RA and AHMED, H (1982) A STUDY OF PULSED LASER AND MULTIPLE-SCAN ELECTRON-BEAM ANNEALING OF ARSENIC FOR N-CHANNEL MOS-TRANSISTOR SOURCE DRAIN REGIONS. J ELECTROCHEM SOC, 129. C325-C325. ISSN 0013-4651

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Electronics, Power & Energy Conversion
Depositing User: Cron Job
Date Deposited: 09 Dec 2016 17:50
Last Modified: 29 Mar 2017 03:04
DOI: