Tse, KY and Robertson, J (2006) Interfacial atomic structures, energetics and band offsets of Ge : ZrO2 interfaces. J APPL PHYS, 100. -. ISSN 0021-8979
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| Item Type: | Article |
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| Uncontrolled Keywords: | ALTERNATIVE GATE DIELECTRICS HIGH-K (100)GE/HFO2 INTERFACE ELECTRONIC-STRUCTURE THERMAL-STABILITY LAYER DEPOSITION CONSTANT OXIDES SILICON GERMANIUM HFO2 |
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| Subjects: | UNSPECIFIED |
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| Divisions: | UNSPECIFIED |
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| Depositing User: | Cron Job |
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| Date Deposited: | 19 Jan 2012 10:12 |
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| Last Modified: | 11 Mar 2013 01:50 |
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| DOI: | 10.1063/1.2369645 |
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