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Work function control at metal high-dielectric-constant gate oxide interfaces

Tse, K and Robertson, J (2008) Work function control at metal high-dielectric-constant gate oxide interfaces. In: UNSPECIFIED pp. 9-14..

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Item Type: Conference or Workshop Item (UNSPECIFIED)
Uncontrolled Keywords: metal gates high K oxides BAND OFFSETS SILICON AL2O3 STABILITY SURFACES LAYER ZRO2
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Unnamed user with email sms67@cam.ac.uk
Date Deposited: 15 Dec 2015 13:24
Last Modified: 11 Feb 2016 22:17
DOI: 10.1016/j.mee.2007.01.240