Tse, K and Robertson, J (2008) Work function control at metal high-dielectric-constant gate oxide interfaces. In: UNSPECIFIED pp. 9-14..
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| Item Type: | Conference or Workshop Item (UNSPECIFIED) |
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| Uncontrolled Keywords: | metal gates high K oxides BAND OFFSETS SILICON AL2O3 STABILITY SURFACES LAYER ZRO2 |
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| Subjects: | UNSPECIFIED |
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| Divisions: | UNSPECIFIED |
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| Depositing User: | Cron Job |
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| Date Deposited: | 19 Jan 2012 10:12 |
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| Last Modified: | 27 May 2013 01:18 |
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| DOI: | 10.1016/j.mee.2007.01.240 |
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