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Te-induced modulation of the Mo/HfO2 interface effective work function

Xiong, K and Delugas, P and Hooker, JC and Fiorentini, V and Robertson, J and Liu, DM and Pourtois, G (2008) Te-induced modulation of the Mo/HfO2 interface effective work function. APPL PHYS LETT, 92. -. ISSN 0003-6951

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Item Type: Article
Uncontrolled Keywords: GATE OXIDES METAL TECHNOLOGY STABILITY DEVICES
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:31
Last Modified: 17 Mar 2014 15:02
DOI: 10.1063/1.2870078

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