Mihaila, A and Udrea, F and Azar, R and Liang, J and Amaratunga, G and Rusu, A and Brezeanu, G (1999) Theoretical and numerical investigation of SiC JFET and MOSFET at 6.5 kV. Proceedings of the International Semiconductor Conference, CAS, 1. pp. 191-194.Full text not available from this repository.
This paper presents a preliminary theoretical and numerical investigation of 4H-SiC JFET and MOSFET at 6.5 kV. To improve the on-state/breakdown performance of the JFET, buried layers in conjunction with a highly doped buffer layer have been used. Trench technology has been employed for the MOSFET. The devices were simulated and optimized using MEDICI[I] simulator. From the comparison between the two devices, it turns out that the JFET offers a better on-state/breakdown trade-off, while the trench MOSFET has the advantage of MOS-control.
|Depositing User:||Cron job|
|Date Deposited:||04 Feb 2015 23:07|
|Last Modified:||05 Feb 2015 01:26|