Lantz, MA and O'Shea, SJ and Welland, ME (1999) Measurement of forces during the modification of C60 islands. Surface Science, 437. pp. 99-106. ISSN 0039-6028Full text not available from this repository.
A UHV atomic force microscope with a conducting tip is used to measure the tip-sample conductance as a function of the applied force on well-ordered, monolayer islands of C60 on Cu(111). By imaging the sample before and after each force-distance experiment, it was possible to investigate the forces required for the removal of individual C60 molecules from the islands. The removal of C60 occurs near defects or edges of the C60 islands and requires an applied force of 5-20 nN, which corresponds to applied pressures of order 1 GPa. In addition, it was possible to investigate the strength of the C60 film on the molecular scale. It was found that the mechanical stiffness of a C60 molecule is of order 6 N/m and the islands appear to undergo a reversible yield process at an applied pressure of around 1.2 GPa.
|Divisions:||Div B > Solid State Electronics and Nanoscale Science|
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|Date Deposited:||18 May 2016 18:42|
|Last Modified:||28 Jul 2016 05:41|