Li, SP and Chu, DP and Newsome, CJ and Russell, DM and Kugler, T and Ishida, M and Shimoda, T (2005) Short-channel polymer field-effect-transistor fabrication using spin-coating-induced edge template and ink-jet printing. Applied Physics Letters, 87. pp. 1-3. ISSN 0003-6951Full text not available from this repository.
A method to fabricate polymer field-effect transistors with submicron channel lengths is described. A thin polymer film is spin coated on a prepatterned resist with a low resolution to create a thickness contrast in the overcoated polymer layer. After plasma and solvent etching, a submicron-sized line structure, which templates the contour of the prepattern, is obtained. A further lift-off process is applied to define source-drain electrodes of transistors. With a combination of ink-jet printing, transistors with channel length down to 400 nm have been fabricated by this method. We show that drive current density increases as expected, while the on/off current ratio 106 is achieved. © 2005 American Institute of Physics.
|Divisions:||Div B > Photonics|
|Depositing User:||Cron Job|
|Date Deposited:||07 Mar 2014 11:31|
|Last Modified:||12 Dec 2014 19:04|