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How to achieve high mobility thin film transistors by direct deposition of silicon using 13.56 MHz RF PECVD?

Lee, C-H and Sazonov, A and Robertson, J and Nathan, A and Esmaeili-Rad, MR and Servati, P and Milne, WI (2006) How to achieve high mobility thin film transistors by direct deposition of silicon using 13.56 MHz RF PECVD? Technical Digest - International Electron Devices Meeting, IEDM. ISSN 0163-1918

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Cron Job
Date Deposited: 20 Dec 2011 12:10
Last Modified: 20 May 2013 01:40
DOI:

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