Li, FM and Waddingham, R and Milne, WI and Flewitt, AJ and Speakman, S and Dutson, J and Wakeham, S and Thwaites, M (2011) Low temperature (< 100 °C) deposited P-type cuprous oxide thin films: Importance of controlled oxygen and deposition energy. Thin Solid Films. ISSN 0040-6090Full text not available from this repository.
|Divisions:||Div B > Solid State Electronics and Nanoscale Science|
|Depositing User:||Cron Job|
|Date Deposited:||07 Mar 2014 12:43|
|Last Modified:||17 Mar 2014 14:32|
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