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Low temperature (< 100 °C) deposited P-type cuprous oxide thin films: Importance of controlled oxygen and deposition energy

Li, FM and Waddingham, R and Milne, WI and Flewitt, AJ and Speakman, S and Dutson, J and Wakeham, S and Thwaites, M (2011) Low temperature (< 100 °C) deposited P-type cuprous oxide thin films: Importance of controlled oxygen and deposition energy. Thin Solid Films. ISSN 0040-6090

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Cron job
Date Deposited: 04 Feb 2015 23:15
Last Modified: 05 Feb 2015 01:34
DOI: