Li, FM and Waddingham, R and Milne, WI and Flewitt, AJ and Speakman, S and Dutson, J and Wakeham, S and Thwaites, M (2011) Low temperature (< 100 °C) deposited P-type cuprous oxide thin films: Importance of controlled oxygen and deposition energy. Thin Solid Films. ISSN 0040-6090Full text not available from this repository.
|Divisions:||Div B > Solid State Electronics and Nanoscale Science|
|Depositing User:||Cron Job|
|Date Deposited:||18 May 2016 19:13|
|Last Modified:||28 May 2016 00:35|