Esmaeili Rad, MR and Lee, CH and Sazonov, A and Nathan, A (2007) Nanocrystalline silicon films deposited by RF PECVD for bottom-gate thin-film transistors. In: UNSPECIFIED pp. 627-632..
Full text not available from this repository.| Item Type: | Conference or Workshop Item (UNSPECIFIED) |
|---|---|
| Uncontrolled Keywords: | MICROCRYSTALLINE SILICON PLASMA |
| Subjects: | UNSPECIFIED |
| Divisions: | Div B > Solid State Electronics and Nanoscale Science |
| Depositing User: | Cron Job |
| Date Deposited: | 17 Jul 2017 19:37 |
| Last Modified: | 22 May 2018 06:19 |
| DOI: |
