Esmaeili Rad, MR and Lee, CH and Sazonov, A and Nathan, A (2007) Nanocrystalline silicon films deposited by RF PECVD for bottom-gate thin-film transistors. In: UNSPECIFIED pp. 627-632..
Full text not available from this repository.Item Type: | Conference or Workshop Item (UNSPECIFIED) |
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Uncontrolled Keywords: | MICROCRYSTALLINE SILICON PLASMA |
Subjects: | UNSPECIFIED |
Divisions: | Div B > Solid State Electronics and Nanoscale Science |
Depositing User: | Cron Job |
Date Deposited: | 17 Jul 2017 19:37 |
Last Modified: | 19 Apr 2018 02:53 |
DOI: |