Esmaeili Rad, MR and Lee, CH and Sazonov, A and Nathan, A (2007) Nanocrystalline silicon films deposited by RF PECVD for bottom-gate thin-film transistors. In: UNSPECIFIED pp. 627-632..
Full text not available from this repository.| Item Type: | Conference or Workshop Item (UNSPECIFIED) |
|---|---|
| Uncontrolled Keywords: | MICROCRYSTALLINE SILICON PLASMA |
| Subjects: | UNSPECIFIED |
| Divisions: | UNSPECIFIED |
| Depositing User: | Cron job |
| Date Deposited: | 04 Feb 2015 22:09 |
| Last Modified: | 05 Feb 2015 00:14 |
| DOI: |
