CUED Publications database

Nanocrystalline silicon films deposited by RF PECVD for bottom-gate thin-film transistors

Esmaeili Rad, MR and Lee, CH and Sazonov, A and Nathan, A (2007) Nanocrystalline silicon films deposited by RF PECVD for bottom-gate thin-film transistors. In: UNSPECIFIED pp. 627-632..

Full text not available from this repository.
Item Type: Conference or Workshop Item (UNSPECIFIED)
Uncontrolled Keywords: MICROCRYSTALLINE SILICON PLASMA
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Cron job
Date Deposited: 16 Jul 2015 13:45
Last Modified: 31 Aug 2015 06:11
DOI: