CUED Publications database

Nanocrystalline silicon films deposited by RF PECVD for bottom-gate thin-film transistors

Esmaeili Rad, MR and Lee, CH and Sazonov, A and Nathan, A (2007) Nanocrystalline silicon films deposited by RF PECVD for bottom-gate thin-film transistors. In: UNSPECIFIED pp. 627-632..

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Item Type: Conference or Workshop Item (UNSPECIFIED)
Uncontrolled Keywords: MICROCRYSTALLINE SILICON PLASMA
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 02 Sep 2016 17:07
Last Modified: 29 Sep 2016 09:57
DOI: