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Stability of indium-oxide thin-film transistors by reactive ion beam assisted deposition

Vygranenko, Y and Wang, K and Chaji, R and Vieira, M and Robertson, J and Nathan, A (2009) Stability of indium-oxide thin-film transistors by reactive ion beam assisted deposition. In: UNSPECIFIED pp. 6341-6344..

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Item Type: Conference or Workshop Item (UNSPECIFIED)
Uncontrolled Keywords: Electronic devices Indium oxide Silicon oxide PERFORMANCE
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:31
Last Modified: 17 Mar 2014 15:02
DOI: 10.1016/j.tsf.2009.02.108

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