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Low temperature (< 100 °c) deposited P-type cuprous oxide thin films: Importance of controlled oxygen and deposition energy

Li, FM and Waddingham, R and Milne, WI and Flewitt, AJ and Speakman, S and Dutson, J and Wakeham, S and Thwaites, M (2011) Low temperature (< 100 °c) deposited P-type cuprous oxide thin films: Importance of controlled oxygen and deposition energy. Thin Solid Films, 520. pp. 1278-1284. ISSN 0040-6090

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:42
Last Modified: 24 Mar 2014 01:15
DOI:

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