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Metastability mechanisms in thin film transistors quantitatively resolved using post-stress relaxation of threshold voltage

Fomani, A and Nathan, A, (2011) Metastability mechanisms in thin film transistors quantitatively resolved using post-stress relaxation of threshold voltage. Journal of Applied Physics, 19. pp. 1-6.

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Abstract

A new approach is presented to resolve bias-induced metastability mechanisms in hydrogenated amorphous silicon (a-Si:H) thin film transistors (TFTs). The post stress relaxation of threshold voltage (V(T)) was employed to quantitatively distinguish between the charge trapping process in gate dielectric and defect state creation in active layer of transistor. The kinetics of the charge de-trapping from the SiN traps is analytically modeled and a Gaussian distribution of gap states is extracted for the SiN. Indeed, the relaxation in V(T) is in good agreement with the theory underlying the kinetics of charge de-trapping from gate dielectric. For the TFTs used in this work, the charge trapping in the SiN gate dielectric is shown to be the dominant metastability mechanism even at bias stress levels as low as 10 V.

Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:30
Last Modified: 13 Oct 2014 01:12
DOI: 10.1063/1.3569702