CUED Publications database

Low-temperature growth of carbon nanotubes by plasma-enhanced chemical vapor deposition

Hofmann, S and Ducati, C and Robertson, J and Kleinsorge, B (2003) Low-temperature growth of carbon nanotubes by plasma-enhanced chemical vapor deposition. Applied Physics Letters, 83. pp. 135-137. ISSN 0003-6951

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Abstract

Vertically aligned carbon nanotubes were grown at temperatures as low as 120degreesC by plasma-enhanced chemical vapor deposition. A systematic study of the temperature dependence of the growth rate and the structure of the as-grown nanotubes is presented using a C2H2/NH3 system and nickel as the catalyst. The activation energy for the growth rate was found to be 0.23 eV, much less than for thermal chemical vapor deposition (1.2-1.5 eV). This suggests growth occurs by surface diffusion of carbon on nickel. The result could allow direct growth of nanotubes onto low-temperature substrates like plastics, and facilitate the integration in sensitive nanoelectronic devices. (C) 2003 American Institute of Physics.

Item Type: Article
Uncontrolled Keywords: diffusion patterned growth nanofibers nickel
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:20
Last Modified: 20 Oct 2014 01:09
DOI: 10.1063/1.1589187