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IMPLANTATION-DOMINATED JUNCTION DEPTHS OF LOW-TEMPERATURE AND ELECTRON-BEAM-ANNEALED AS SOURCE DRAIN REGIONS

AMARATUNGA, GAJ and KNEE, ND and HART, MJ and EVANS, AGR (1987) IMPLANTATION-DOMINATED JUNCTION DEPTHS OF LOW-TEMPERATURE AND ELECTRON-BEAM-ANNEALED AS SOURCE DRAIN REGIONS. IEEE T ELECTRON DEV, 34. pp. 445-448. ISSN 0018-9383

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Item Type: Article
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Depositing User: Cron job
Date Deposited: 16 Jul 2015 13:51
Last Modified: 01 Aug 2015 02:01
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