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IMPLANTATION-DOMINATED JUNCTION DEPTHS OF LOW-TEMPERATURE AND ELECTRON-BEAM-ANNEALED AS SOURCE DRAIN REGIONS

AMARATUNGA, GAJ and KNEE, ND and HART, MJ and EVANS, AGR (1987) IMPLANTATION-DOMINATED JUNCTION DEPTHS OF LOW-TEMPERATURE AND ELECTRON-BEAM-ANNEALED AS SOURCE DRAIN REGIONS. IEEE T ELECTRON DEV, 34. pp. 445-448. ISSN 0018-9383

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Electronics, Power & Energy Conversion
Depositing User: Cron Job
Date Deposited: 09 Dec 2016 17:51
Last Modified: 24 May 2017 03:11
DOI: