CUED Publications database

The Modeling of Ion Implantation in a Three-Layer Structure Using the Method of Dose Matching

Amaratunga, GAJ and Sabine, K and Evans, AGR (1985) The Modeling of Ion Implantation in a Three-Layer Structure Using the Method of Dose Matching. IEEE Transactions on Electron Devices, 32. pp. 1889-1890. ISSN 0018-9383

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Abstract

The method of modeling ion implantation in a multilayer target using moments of a statistical distribution and numerical integration for dose calculation in each target layer is applied to the modelling of As < sup > + < /sup > in poly-Si/SiO < inf > 2 < /inf > /Si. Good agreement with experiment is obtained. Copyright © 1985 by The Institute of Electrical and Electronics Engineers, Inc.

Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Electronics, Power & Energy Conversion
Depositing User: Cron Job
Date Deposited: 17 Jul 2017 19:39
Last Modified: 03 Aug 2017 03:11
DOI: