Ismail, R and Amaratunga, G (1985) SIMPLE REMESHING SCHEME FOR THE FINITE ELEMENT BASED SIMULATION OF DOPANT DIFFUSION IN SILICON. IEE Colloquium (Digest). ISSN 0963-3308Full text not available from this repository.
Process simulation programs are valuable in generating accurate impurity profiles. Apart from accuracy the programs should also be efficient so as not to consume vast computer memory. This is especially true for devices and circuits of VLSI complexity. In this paper a remeshing scheme to make the finite element based solution of the non-linear diffusion equation more efficient is proposed. A remeshing scheme based on comparing the concentration values of adjacent node was then implemented and found to remove the problems of oscillation.
|Depositing User:||Cron job|
|Date Deposited:||04 Feb 2015 23:03|
|Last Modified:||05 Feb 2015 01:21|