CUED Publications database

Occurrence of particle debris field during focused Ga ion beam milling of glassy carbon

Hu, Q and O'Neill, W (2010) Occurrence of particle debris field during focused Ga ion beam milling of glassy carbon. Applied Surface Science, 256. pp. 5952-5956. ISSN 0169-4332

Full text not available from this repository.

Abstract

To explore the machining characteristics of glassy carbon by focused ion beam (FIB), particles induced by FIB milling on glassy carbon have been studied in the current work. Nano-sized particles in the range of tens of nanometers up to 400 nm can often be found around the area subject to FIB milling. Two ion beam scanning modes - slow single scan and fast repetitive scan - have been tested. Fewer particles are found in single patterns milled in fast repetitive scan mode. For a group of test patterns milled in a sequence, it was found that a greater number of particles were deposited around sites machined early in the sequence. In situ EDX analysis of the particles showed that they were composed of C and Ga. The formation of particles is related to the debris generated at the surrounding areas, the low melting point of gallium used as FIB ion source and the high contact angle of gallium on glassy carbon induces de-wetting of Ga and the subsequent formation of Ga particles. Ultrasonic cleaning can remove over 98% of visible particles. The surface roughness (Ra) of FIB milled areas after cleaning is less than 2 nm. © 2010.

Item Type: Article
Uncontrolled Keywords: Cleaning Focused ion beam (FIB) Glassy carbon Milling Nano-particles Ultrasonic
Subjects: UNSPECIFIED
Divisions: Div E > Production Processes
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:29
Last Modified: 08 Dec 2014 02:36
DOI: 10.1016/j.apsusc.2010.03.085