Kidambi, PR and Ducati, C and Dlubak, B and Gardiner, D and Weatherup, RS and Martin, MB and Seneor, P and Coles, H and Hofmann, S (2012) The parameter space of graphene chemical vapor deposition on polycrystalline Cu. Journal of Physical Chemistry C, 116. pp. 22492-22501. ISSN 1932-7447Full text not available from this repository.
A systematic study of the parameter space of graphene chemical vapor deposition (CVD) on polycrystalline Cu foils is presented, aiming at a more fundamental process rationale in particular regarding the choice of carbon precursor and mitigation of Cu sublimation. CH 4 as precursor requires H 2 dilution and temperatures ≥1000 °C to keep the Cu surface reduced and yield a high-quality, complete monolayer graphene coverage. The H 2 atmosphere etches as-grown graphene; hence, maintaining a balanced CH 4/H 2 ratio is critical. Such balance is more easily achieved at low-pressure conditions, at which however Cu sublimation reaches deleterious levels. In contrast, C 6H 6 as precursor requires no reactive diluent and consistently gives similar graphene quality at 100-150 °C lower temperatures. The lower process temperature and more robust processing conditions allow the problem of Cu sublimation to be effectively addressed. Graphene formation is not inherently self-limited to a monolayer for any of the precursors. Rather, the higher the supplied carbon chemical potential, the higher the likelihood of film inhomogeneity and primary and secondary multilayer graphene nucleation. For the latter, domain boundaries of the inherently polycrystalline CVD graphene offer pathways for a continued carbon supply to the catalyst. Graphene formation is significantly affected by the Cu crystallography; i.e., the evolution of microstructure and texture of the catalyst template form an integral part of the CVD process. © 2012 American Chemical Society.
|Divisions:||Div B > Solid State Electronics and Nanoscale Science|
Div B > Photonics
|Depositing User:||Cron Job|
|Date Deposited:||02 Sep 2016 16:17|
|Last Modified:||23 Oct 2016 00:53|