Liu, D and Tse, K and Robertson, J (2007) Electronic structure and defects of high dielectric constant gate oxide La2Hf2O7. APPL PHYS LETT, 90. -. ISSN 0003-6951
Full text not available from this repository.| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | WORK FUNCTION THIN-FILMS |
| Subjects: | UNSPECIFIED |
| Divisions: | UNSPECIFIED |
| Depositing User: | Cron Job |
| Date Deposited: | 19 Jan 2012 11:11 |
| Last Modified: | 20 May 2013 08:10 |
| DOI: | 10.1063/1.2433031 |
Actions (login required)
| View Item |
