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Fabrication of Sub-10 nm Metallic Lines of Low Line-Width Roughness by Hydrogen Reduction of Patterned Metal-Organic Materials

Nedelcu, M and Saifullah, MSM and Hasko, DG and Jang, A and Anderson, D and Huck, WTS and Jones, GAC and Welland, ME and Kang, DJ and Steiner, U (2010) Fabrication of Sub-10 nm Metallic Lines of Low Line-Width Roughness by Hydrogen Reduction of Patterned Metal-Organic Materials. ADV FUNCT MATER, 20. pp. 2317-2323. ISSN 1616-301X

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Item Type: Article
Uncontrolled Keywords: BEAM-INDUCED DEPOSITION ELECTRON-BEAM NANOCRYSTALLINE NICKEL DIPPING-PYROLYSIS COMPOSITE OXIDES FILMS LITHOGRAPHY ZNO
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:41
Last Modified: 11 Aug 2014 01:11
DOI: 10.1002/adfm.201000219

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