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Patterning method to create a mask

UNSPECIFIED (2008) Patterning method to create a mask. WO2010019184 (A1).

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Abstract

A method of creating micro patterned devices by patterning thin films which are deposited on a substrate. A channel or channels is created on the substrate, the width being of fine enough resolution such that a flowable mask material can be drawn along the channel by capillary forces

Item Type: Patent
Additional Information: The original pattern of channels can be made by stamping (or nano-imprint) which can be done very cheaply. The mask material can be digitally deposited, so avoiding the need to process the whole panel with its consequent risk of damaging previously manufactured elements
Uncontrolled Keywords: mask flowable manufacture electronic thin-film pattern
Subjects: UNSPECIFIED
Divisions: Div B > Photonics
Depositing User: Cron Job
Date Deposited: 07 Jan 2013 11:10
Last Modified: 18 Mar 2013 01:07
DOI: WO2010019184 (A1)

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