UNSPECIFIED (2008) Method of etching. WO2009142704 (A1).
Full text not available from this repository.Abstract
A method of creating micro patterned devices by patterning thin films which are deposited on a substrate. A channel or channels is created on the substrate, the width being of fine enough resolution such that a flowable mask material can be drawn along the channel by capillary forces.
| Item Type: | Patent |
|---|---|
| Additional Information: | A way of doing patternwise etching without using photolith. etchant or mask can be flowed along stamped channels in a substrate to create either a patternwise etch or "NOT etch" as part of a low-cost large-area manufacturing process for thin film devices |
| Uncontrolled Keywords: | channel micropattern pattern etch manufacture |
| Subjects: | UNSPECIFIED |
| Divisions: | Div B > Photonics |
| Depositing User: | Cron Job |
| Date Deposited: | 07 Jan 2013 11:10 |
| Last Modified: | 18 Mar 2013 01:07 |
| DOI: | WO2009142704 (A1) |
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