CUED Publications database

Method of etching

UNSPECIFIED (2008) Method of etching. doi:.

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A method of creating micro patterned devices by patterning thin films which are deposited on a substrate. A channel or channels is created on the substrate, the width being of fine enough resolution such that a flowable mask material can be drawn along the channel by capillary forces.

Item Type: Patent
Uncontrolled Keywords: channel micropattern pattern etch manufacture
Divisions: Div B > Photonics
Depositing User: Unnamed user with email
Date Deposited: 18 May 2016 19:29
Last Modified: 24 Aug 2016 02:36