UNSPECIFIED (2008) Method of etching. WO2009142704 (A1).Full text not available from this repository.
A method of creating micro patterned devices by patterning thin films which are deposited on a substrate. A channel or channels is created on the substrate, the width being of fine enough resolution such that a flowable mask material can be drawn along the channel by capillary forces.
|Additional Information:||A way of doing patternwise etching without using photolith. etchant or mask can be flowed along stamped channels in a substrate to create either a patternwise etch or "NOT etch" as part of a low-cost large-area manufacturing process for thin film devices|
|Uncontrolled Keywords:||channel micropattern pattern etch manufacture|
|Divisions:||Div B > Photonics|
|Depositing User:||Cron Job|
|Date Deposited:||07 Jan 2013 11:10|
|Last Modified:||16 Sep 2013 01:07|
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