CUED Publications database

The influence of stoichiometry on the structural stability and on the optical emission of erbium silicate thin films

Lo Savio, R and Miritello, M and Piro, AM and Priolo, F and Iacona, F (2008) The influence of stoichiometry on the structural stability and on the optical emission of erbium silicate thin films. Applied Physics Letters, 93. ISSN 0003-6951

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Abstract

We report the effects of thermal annealing performed in N2 or O2 ambient at 1200 °C on the structural and optical properties of Er silicate films having different compositions (Er2Si O 5,Er2 Si2 O7, and their mixture). We demonstrate that the chemical composition of the stoichiometric films is preserved after the thermal treatments. All different crystalline structures formed after the thermal annealing are identified. Thermal treatments in O 2 lead to a strong enhancement of the photoluminescence intensity, owing to the efficient reduction of defect density. In particular the highest optical efficiency is associated to Er ions in the α phase of Er 2 Si2 O7. © 2008 American Institute of Physics.

Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Photonics
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:29
Last Modified: 08 Dec 2014 02:28
DOI: 10.1063/1.2957034