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Optical and structural properties of Er<inf>2</inf>O<inf>3</inf> films grown by magnetron sputtering

Miritello, M and Lo Savio, R and Piro, AM and Franzò, G and Priolo, F and Iacona, F and Bongiorno, C (2006) Optical and structural properties of Er<inf>2</inf>O<inf>3</inf> films grown by magnetron sputtering. Journal of Applied Physics, 100. ISSN 0021-8979

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Abstract

The structural properties and the room temperature luminescence of Er 2 O 3 thin films deposited by magnetron sputtering have been studied. In spite of the well-known high reactivity of rare earth oxides towards silicon, films characterized by good morphological properties have been obtained by using a SiO 2 interlayer between the film and the silicon substrate. The evolution of the properties of the Er 2 O 3 films due to thermal annealing processes in oxygen ambient performed at temperatures in the range of 800-1200°C has been investigated in detail. The existence of well defined annealing conditions (rapid treatments at a temperature of 1100°C or higher) allowing to avoid the occurrence of extensive chemical reactions with the oxidized substrate has been demonstrated; under these conditions, the thermal process has a beneficial effect on both structural and optical properties of the film, and an increase of the photoluminescence (PL) intensity by about a factor of 40 with respect to the as-deposited material has been observed. The enhanced efficiency of the photon emission process has been correlated with the longer lifetime of the PL signal. Finally, the conditions leading to a reaction of Er 2 O 3 with the substrate have been also identified, and evidences about the formation of silicate-like phases have been collected. © 2006 American Institute of Physics.

Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Photonics
Depositing User: Cron Job
Date Deposited: 17 Jul 2017 19:25
Last Modified: 25 Jul 2017 05:27
DOI: