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Optical and structural properties of Er<inf>2</inf>O<inf>3</inf> films grown by magnetron sputtering

Miritello, M and Lo Savio, R and Piro, AM and Franzò, G and Priolo, F and Iacona, F and Bongiorno, C (2006) Optical and structural properties of Er<inf>2</inf>O<inf>3</inf> films grown by magnetron sputtering. Journal of Applied Physics, 100. ISSN 0021-8979

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The structural properties and the room temperature luminescence of Er 2O3 thin films deposited by magnetron sputtering have been studied. In spite of the well-known high reactivity of rare earth oxides towards silicon, films characterized by good morphological properties have been obtained by using a SiO2 interlayer between the film and the silicon substrate. The evolution of the properties of the Er2O3 films due to thermal annealing processes in oxygen ambient performed at temperatures in the range of 800-1200°C has been investigated in detail. The existence of well defined annealing conditions (rapid treatments at a temperature of 1100°C or higher) allowing to avoid the occurrence of extensive chemical reactions with the oxidized substrate has been demonstrated; under these conditions, the thermal process has a beneficial effect on both structural and optical properties of the film, and an increase of the photoluminescence (PL) intensity by about a factor of 40 with respect to the as-deposited material has been observed. The enhanced efficiency of the photon emission process has been correlated with the longer lifetime of the PL signal. Finally, the conditions leading to a reaction of Er2O3 with the substrate have been also identified, and evidences about the formation of silicate-like phases have been collected. © 2006 American Institute of Physics.

Item Type: Article
Divisions: Div B > Photonics
Depositing User: Cron Job
Date Deposited: 09 Dec 2016 17:25
Last Modified: 25 May 2017 10:53