Bayer, BC and Castellarin-Cudia, C and Blume, R and Steiner, SA and Ducati, C and Chu, D and Goldoni, A and Knop-Gericke, A and Schlögl, R and Cepek, C and Robertson, J and Hofmann, S (2013) Tantalum-oxide catalysed chemical vapour deposition of single- and multi-walled carbon nanotubes. RSC Advances, 3. pp. 4086-4092.Full text not available from this repository.
Tantalum-oxide thin films are shown to catalyse single- and multi-walled carbon nanotube growth by chemical vapour deposition. A low film thickness, the nature of the support material (best results with SiO<inf>2</inf>) and an atmospheric process gas pressure are of key importance for successful nanotube nucleation. Strong material interactions, such as silicide formation, inhibit nanotube growth. In situ X-ray photoelectron spectroscopy indicates that no catalyst reduction to Ta-metal or Ta-carbide occurs during our nanotube growth conditions and that the catalytically active phase is the Ta-oxide phase. Such a reduction-free oxide catalyst can be technologically advantageous. © 2013 The Royal Society of Chemistry.
|Divisions:||Div B > Photonics|
Div B > Solid State Electronics and Nanoscale Science
|Depositing User:||Unnamed user with email email@example.com|
|Date Deposited:||15 Dec 2015 13:06|
|Last Modified:||12 Feb 2016 21:46|