CUED Publications database

Tantalum-oxide catalysed chemical vapour deposition of single- and multi-walled carbon nanotubes

Bayer, BC and Castellarin-Cudia, C and Blume, R and Steiner, SA and Ducati, C and Chu, D and Goldoni, A and Knop-Gericke, A and Schlögl, R and Cepek, C and Robertson, J and Hofmann, S (2013) Tantalum-oxide catalysed chemical vapour deposition of single- and multi-walled carbon nanotubes. RSC Advances, 3. pp. 4086-4092.

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Abstract

Tantalum-oxide thin films are shown to catalyse single- and multi-walled carbon nanotube growth by chemical vapour deposition. A low film thickness, the nature of the support material (best results with SiO<inf>2</inf>) and an atmospheric process gas pressure are of key importance for successful nanotube nucleation. Strong material interactions, such as silicide formation, inhibit nanotube growth. In situ X-ray photoelectron spectroscopy indicates that no catalyst reduction to Ta-metal or Ta-carbide occurs during our nanotube growth conditions and that the catalytically active phase is the Ta-oxide phase. Such a reduction-free oxide catalyst can be technologically advantageous. © 2013 The Royal Society of Chemistry.

Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Photonics
Div B > Solid State Electronics and Nanoscale Science
Depositing User: Unnamed user with email sms67@cam.ac.uk
Date Deposited: 18 May 2016 18:11
Last Modified: 28 Aug 2016 22:17
DOI: