Bayer, BC and Castellarin-Cudia, C and Blume, R and Steiner, SA and Ducati, C and Chu, D and Goldoni, A and Knop-Gericke, A and Schlögl, R and Cepek, C and Robertson, J and Hofmann, S (2013) Tantalum-oxide catalysed chemical vapour deposition of single- and multi-walled carbon nanotubes. RSC Advances, 3. pp. 4086-4092. ISSN 2046-2069Full text not available from this repository.
Tantalum-oxide thin films are shown to catalyse single- and multi-walled carbon nanotube growth by chemical vapour deposition. A low film thickness, the nature of the support material (best results with SiO2) and an atmospheric process gas pressure are of key importance for successful nanotube nucleation. Strong material interactions, such as silicide formation, inhibit nanotube growth. In situ X-ray photoelectron spectroscopy indicates that no catalyst reduction to Ta-metal or Ta-carbide occurs during our nanotube growth conditions and that the catalytically active phase is the Ta-oxide phase. Such a reduction-free oxide catalyst can be technologically advantageous. This journal is © 2013 The Royal Society of Chemistry.
|Divisions:||Div B > Photonics|
Div B > Solid State Electronics and Nanoscale Science
|Depositing User:||Cron Job|
|Date Deposited:||07 Mar 2014 11:23|
|Last Modified:||08 Dec 2014 02:27|