CUED Publications database

Tantalum-oxide catalysed chemical vapour deposition of single- and multi-walled carbon nanotubes

Bayer, BC and Castellarin-Cudia, C and Blume, R and Steiner, SA and Ducati, C and Chu, D and Goldoni, A and Knop-Gericke, A and Schlögl, R and Cepek, C and Robertson, J and Hofmann, S (2013) Tantalum-oxide catalysed chemical vapour deposition of single- and multi-walled carbon nanotubes. RSC Advances, 3. pp. 4086-4092. ISSN 2046-2069

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Abstract

Tantalum-oxide thin films are shown to catalyse single- and multi-walled carbon nanotube growth by chemical vapour deposition. A low film thickness, the nature of the support material (best results with SiO2) and an atmospheric process gas pressure are of key importance for successful nanotube nucleation. Strong material interactions, such as silicide formation, inhibit nanotube growth. In situ X-ray photoelectron spectroscopy indicates that no catalyst reduction to Ta-metal or Ta-carbide occurs during our nanotube growth conditions and that the catalytically active phase is the Ta-oxide phase. Such a reduction-free oxide catalyst can be technologically advantageous. This journal is © 2013 The Royal Society of Chemistry.

Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Photonics
Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:23
Last Modified: 08 Dec 2014 02:27
DOI: 10.1039/c3ra23304a