Zhuo, VY-Q and Jiang, Y and Li, MH and Chua, EK and Zhang, Z and Pan, JS and Zhao, R and Shi, LP and Chong, TC and Robertson, J (2013) Band alignment between Ta2O5 and metals for resistive random access memory electrodes engineering. Applied Physics Letters, 102. ISSN 0003-6951Full text not available from this repository.
|Divisions:||Div B > Solid State Electronics and Nanoscale Science|
|Depositing User:||Cron Job|
|Date Deposited:||07 Mar 2014 11:25|
|Last Modified:||14 Jul 2014 01:08|
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