CUED Publications database

Band alignment between Ta2O5 and metals for resistive random access memory electrodes engineering

Zhuo, VY-Q and Jiang, Y and Li, MH and Chua, EK and Zhang, Z and Pan, JS and Zhao, R and Shi, LP and Chong, TC and Robertson, J (2013) Band alignment between Ta2O5 and metals for resistive random access memory electrodes engineering. Applied Physics Letters, 102. ISSN 0003-6951

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:25
Last Modified: 03 Nov 2014 01:08
DOI: