Zhuo, VY-Q and Jiang, Y and Li, MH and Chua, EK and Zhang, Z and Pan, JS and Zhao, R and Shi, LP and Chong, TC and Robertson, J (2013) Band alignment between Ta2O5 and metals for resistive random access memory electrodes engineering. Applied Physics Letters, 102. ISSN 0003-6951
Full text not available from this repository.
|Item Type: ||Article|
|Depositing User: ||Cron Job|
|Date Deposited: ||25 Mar 2013 01:03|
|Last Modified: ||03 Dec 2013 19:02|
Actions (login required)