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High-density remote plasma sputtering of high-dielectric-constant amorphous hafnium oxide films

Li, FM and Bayer, BC and Hofmann, S and Speakman, SP and Ducati, C and Milne, WI and Flewitt, AJ (2013) High-density remote plasma sputtering of high-dielectric-constant amorphous hafnium oxide films. Physica Status Solidi (B) Basic Research, 250. pp. 957-967. ISSN 0370-1972

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:23
Last Modified: 13 Oct 2014 01:18
DOI:

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