CUED Publications database

III-V compound semiconductor nanowires

Joyce, HJ and Paiman, S and Gao, Q and Tan, HH and Kim, Y and Smith, LM and Jackson, HE and Yarrison-Rice, JM and Zhang, X and Zou, J and Jagadish, C (2009) III-V compound semiconductor nanowires. 2009 IEEE Nanotechnology Materials and Devices Conference, NMDC 2009. pp. 59-60.

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GaAs and InP based nanowires were grown epitaxially on GaAs or InP (111)B substrates by metalorganic chemical vapor deposition using Au nanoparticles as catalyst. In this talk, I will give an overview of nanowire research activities in our group. Especially, the effects of growth parameters for GaAs and InP nanowires on the crystal quality have been studied in detail. We demonstrated the ability to obtain defect-free GaAs nanowires and control the crystal structure of InP nanowires, ie, WZ or ZB, by choosing a combination of growth parameters, such as temperature, V/III ratio and nanowire diameter. © 2009 IEEE.

Item Type: Article
Uncontrolled Keywords: III-V compound semiconductors MOCVD Nanowires
Depositing User: Unnamed user with email
Date Deposited: 16 Jul 2015 14:07
Last Modified: 30 Nov 2015 09:14
DOI: 10.1109/NMDC.2009.5167572